Inline codeposition modular multi-flux evaporation source with integrated reactive vapor manifold
US12392036B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2022 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | Feb 22, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F77/126
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method includes directing a first flux plume from a first evaporation source to a first reactive codeposition zone; directing a first vapor flux plume from a first vapor distribution manifold to the first reactive codeposition zone, wherein the first vapor distribution manifold is integrated with the first evaporation source to form a first integrated evaporation and vapor distribution manifold; directing a second flux plume from a second evaporation source to a second reactive codeposition zone; and directing a second vapor flux plume from a second vapor distribution manifold to the second reactive codeposition zone, wherein the second vapor distribution manifold is integrated with the second evaporation source to form a second integrated evaporation and vapor distribution manifold. An apparatus includes an inline reactive codeposition modular multi-flux evaporative source with integrated vapor manifold system comprising a first integrated evaporation and vapor distribution manifold including a first evaporation source emitting, when in operation, a first flux plume toward a first reactive codeposition zone; and a first vapor distribution manifold integrated with the first evapo…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.