Apparatus and method for treating a relief precursor with reduced cleaning
US12393120B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 5, 2021 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | Jan 6, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/3064
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for treating a relief precursor such as a printing plate precursor, with a liquid includes a treatment compartment with treatment means configured to treat a relief plate precursor with a liquid and to remove pieces from the relief precursor, and a liquid collection system configured to receive liquid and removed pieces from the treatment means. The liquid collection system is configured to separate pieces having dimensions larger than predefined minimum dimensions from the liquid and to allow at least some of said pieces to be dissolved at least partially in the liquid at least when the liquid is in a static state after or before a treatment of the relief precursor with the treatment means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.