System and method with masking and inpainting strategy for generic defense against patch attacks
US12394028B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 2022 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | Nov 17, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V10/761
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system and method include dividing a source image into a plurality of source regions, which are portions of the source image that correspond to a plurality of grid regions. A mask is used to create a first masked region that masks a first source region and a first unmasked region that comprises a second source region. A first inpainted region is generated by inpainting the first masked region based on the second source region. Similarity data is generated based on a similarity assessment. A protected image is generated that includes at least (i) the first masked region at a first grid region when the similarity data indicates that the first source region is not similar to the first inpainted region and (ii) the first inpainted region at the first grid region when the similarity data indicates that the first source region is similar to the first inpainted region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.