Power control method and device of lower radio frequency power supply and semiconductor processing equipment
US12394593B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2024 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | May 1, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A power control method of a lower RF power supply of semiconductor processing equipment includes, when a processing chamber starts semiconductor processing, with a predetermined power compensation equation and according to a pre-obtained first RF circuit parameter set of a reference chamber and a second RF circuit parameter set of a present processing chamber performing the semiconductor processing, obtaining a power compensation coefficient of the present processing chamber relative to the reference chamber, according to the power compensation coefficient and a power setting value of the lower RF power supply of the present processing chamber, calculating a power compensation value of the present processing chamber relative to the reference chamber, and controlling the lower RF power supply to output the power compensation value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.