Patent · US Active

Anti-reflective assemblies

US12394911B2 · kind B2 · utility

0Cited by
9References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 4, 2022
Grant dateAug 19, 2025
Priority date
Expiry dateAug 6, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01Q1/422
  • WIPO fieldTelecommunications
  • WIPO sectorElectrical engineering

Abstract

Anti-reflective assemblies comprise: a high dielectric permittivity substrate comprising a ceramic and a nonporous multilayer anti-reflective film contacting or adhesively bonded to the substrate. The nonporous multilayer anti-reflective film comprises sequential first, second, and third layers of sequentially decreasing dielectric permittivity. Each layer comprises a respective polymer matrix and filler particles.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.