Patent · US Active

Polishing compositions and methods of use thereof

US12398291B2 · kind B2 · utility

0Cited by
1References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 29, 2021
Grant dateAug 26, 2025
Priority date
Expiry dateJul 28, 2043

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09G1/02
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

This disclosure features a polishing composition that includes at least one abrasive; at least one first corrosion inhibitor that includes a phosphate or a phosphonate group; at least one complexing agent; at least one second corrosion inhibitor that is at least one azole compound; and optionally a pH adjuster.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.