Apparatus, system, and method for measuring the temperature of a substrate
US12399067B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2021 |
| Grant date | Aug 26, 2025 |
| Priority date | — |
| Expiry date | Nov 15, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01K11/125
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A temperature measuring apparatus for measuring a temperature of a substrate is described. A light emitting source that emits light signals such as laser pulses are applied to the substrate. A detector on the other side of the light emitting source receives the reflected laser pulses. The detector further receives emission signals associated with temperature or energy density that is radiated from the surface of the substrate. The temperature measuring apparatus determines the temperature of the substrate during a thermal process using the received laser pulses and the emission signals. To improve the signal to noise ratio of the reflected laser pulses, a polarizer may be used to polarize the laser pulses to have a S polarization. The angle in which the polarized laser pulses are applied towards the substrate may also be controlled to enhance the signal to noise ratio at the detector's end.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.