Patterned organometallic photoresists and methods of patterning
US12399426B2 · kind B2 · utility
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10References
21Claims
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Key dates
| Filing date | Sep 8, 2022 |
| Grant date | Aug 26, 2025 |
| Priority date | — |
| Expiry date | Apr 20, 2044 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0042
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A rinse process is described for processing an initially patterned structure formed with an organometallic radiation sensitive material, in which the rinse process can remove portions of the composition remaining after pattern development to make the patterned structure more uniform such that a greater fraction of patterned structures can meet specifications. The radiation sensitive material can comprise alkyl tin oxide hydroxide compositions. The rinsing process can be effectively used to improve patterning of fine structures using extreme ultraviolet light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.