Photobase generator, compound, photoreactive composition and reaction product
US12399427B2 · kind B2 · utility
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Key dates
| Filing date | Dec 24, 2020 |
| Grant date | Aug 26, 2025 |
| Priority date | — |
| Expiry date | Jun 20, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A photobase generator, includes a compound including a first skeleton represented by the following formula (a); and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, and a pyridine skeleton in addition to the nitrogen atom, in which the compound generates a base in which a hydrogen atom is bonded with the nitrogen atom of the second skeleton by light irradiation. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.