Controller for a matching unit of a plasma processing system
US12399474B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | May 23, 2022 |
| Grant date | Aug 26, 2025 |
| Priority date | — |
| Expiry date | Dec 17, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B19/042
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A matching unit controller working in combination with a matching unit for a plasma processing machine is described. In one example, the controller has a master controller application and acts as a local master in the matching unit. In one example, the controller gathers data from the input and output sensors and feeds the data to an intelligent algorithm. In one example, the output from the algorithm is used to set the matching unit capacitor positions. In one example, the controller also has a slave controller application to communicate with a master controller of the plasma processing machine.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.