Plasma generating device
US12400849B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 15, 2024 |
| Grant date | Aug 26, 2025 |
| Priority date | — |
| Expiry date | Apr 15, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/4215
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma generating device includes: a chamber which is equipped with a dielectric wall structure and into which sample gas to be measured flows; an RF supplying mechanism that generates plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber. The RF supplying mechanism may include an RF field forming unit disposed in a first direction with respect to the chamber and the first electrode may include an electrode disposed in a second direction with respect to the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.