Apparatus for manufacturing display apparatus and method of manufacturing display apparatus
US12400852B2 · kind B2 · utility
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27Claims
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Key dates
| Filing date | Jun 2, 2023 |
| Grant date | Aug 26, 2025 |
| Priority date | — |
| Expiry date | Jun 2, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/1213
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of manufacturing a display apparatus, the method includes removing an oxide layer formed on a surface of a substrate by utilizing a hydrofluoric acid gas and an ammonia gas, and thermally treating the substrate from which the oxide layer has been removed. A flow ratio between the hydrofluoric acid gas and the ammonia gas is about 0.8:1 to about 1:1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.