Patent · US Active

Devices for automatic cleaning of a monocrystalline silicon bar

US12403511B2 · kind B2 · utility

0Cited by

0References

12Claims

0Family size

Assignee

TCL ZHONGHUAN RENEWABLE ENERGY TECHNOLOGY CO., LTD. · CN

Inventors

Haiming Zhang · Pennington, US
Xuzhou Yang · Tianjin, CN
Haoming Zhang · Ann Arbor, US
Chen Wei · Ningbo City, CN
Junwen Guo · Tianjin, CN

Key dates

Filing date	Jul 31, 2023
Grant date	Sep 2, 2025
Priority date	—
Expiry date	Jul 31, 2043

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P70/50
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

Provided are automatic cleaning devices for a monocrystalline silicon bar, which include a base frame, a sprayer, a scrubber, and an air-jetter. Bottom of an inner side of the base frame is configured to place a monocrystalline silicon bar. A plurality of groups of the sprayers, a plurality of groups of the scrubbers, and a plurality of groups of the air-jetters are all disposed on side walls and a top surface of the base frame whose bottom of an inner side is removed. The sprayer is configured to spray the monocrystalline silicon bar. The scrubber is configured to scrub the monocrystalline silicon bar. The air-jetter is configured to purge the monocrystalline silicon bar.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.