High throughput electro-thermal poling
US12404208B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 12, 2023 |
| Grant date | Sep 2, 2025 |
| Priority date | — |
| Expiry date | Nov 6, 2043 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C23/007
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An apparatus for continuous electro-thermal poling of glass or glass ceramic material, includes a lower support conveying and contacting electrode structure, an upper contacting electrode structure positioned above the lower support structure, and one or more DC bias voltage sources connected to one or both of the upper contacting structure and the lower support structure. A process for continuous electro-thermal poling of glass or glass ceramic sheets or substrates includes heating the sheet or substrate, feeding the sheet or substrate continuously or continually, while applying a DC voltage bias, and cooling the sheet or substrate to within 0-30° C. of ambient temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.