Photobase generator, compound, photoreactive composition, and reaction product
US12404240B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 10, 2020 |
| Grant date | Sep 2, 2025 |
| Priority date | — |
| Expiry date | Dec 17, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07D295/192
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A photobase generator includes a compound including: first skeletons represented by the following formula (a); and a second skeleton including nitrogen atoms bonding to bonding positions of the first skeletons to form amide groups, wherein, in a molecule, a number of the first skeletons is two or more, a number of the nitrogen atoms, configuring the amide groups, in the second skeleton is the same as the number of the first skeletons, and at least one of the nitrogen atoms configuring the amide groups is converted into a nitrogen atom configuring a secondary amine or a tertiary amine by light irradiation. In the formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.