Masking film with improved adhesion stability
US12404426B2 · kind B2 · utility
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3References
20Claims
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Key dates
| Filing date | Feb 17, 2021 |
| Grant date | Sep 2, 2025 |
| Priority date | — |
| Expiry date | Mar 19, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09J2477/006
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A masking film includes an adhesion layer that includes at least one hydrogenated styrene block copolymer and an adhesive surface having a surface roughness (Sa) of greater than about 2.0 μm. An Adhesion Build Value of the masking film is less than about 2.0 after the adhesion layer has been attached to a textured polycarbonate substrate and heated to 85° C. for 30 minutes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.