Deposition apparatus and deposition method
US12404579B2 · kind B2 · utility
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1References
9Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 16, 2023 |
| Grant date | Sep 2, 2025 |
| Priority date | — |
| Expiry date | Nov 16, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/135
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A deposition apparatus includes: a chamber; a deposition source disposed in the chamber; a rotating plate disposed in the chamber, where an inkjet head is fixed to the rotating plate to allow a nozzle plate of the inkjet head to be vertically aligned with the deposition source; and a first driving unit disposed in the chamber, where the first driving unit rotates the rotating plate about a vertical axis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.