Electrochemical metal deposition system and method
US12404596B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2022 |
| Grant date | Sep 2, 2025 |
| Priority date | — |
| Expiry date | Jun 1, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D21/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An electrochemical deposition apparatus and method for the selective recovery of metal. The electrochemical deposition apparatus comprises a porous cathodic material, an anode, an inter-electrode region formed by the anode and cathode, and a gas release channel. The method may comprise passing a solution comprising a metal into a cavity, changing an oxidation state of a metal, and selectively depositing the metal onto a porous cathodic material. The electrochemical deposition apparatus may recover metal from metal feed in the form of metal hydroxides. The recovered metal may be from any source including, but not limited to, minerals, electronic waste, and black mass.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.