Patent · US Active

Patterned deposition mask formed using polymer dispersed in a liquid solvent

US12408496B2 · kind B2 · utility

0Cited by

0References

20Claims

0Family size

Assignee

LUMILEDS SINGAPORE PTE. LTD. · SG

Inventors

Jens Meyer · Dresden, DE
Marinus Johannes Petrus Maria van Gerwen · Aachen, DE
Ronja Missong · Aachen, DE

Key dates

Filing date	Oct 25, 2022
Grant date	Sep 2, 2025
Priority date	—
Expiry date	Jul 25, 2043

Classification

Technology area (CPC H)Electricity
CPC primaryH10H29/0361
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A polymer dispersion layer is formed on a substrate or semiconductor light-emitting devices on the substrate. After forming the polymer dispersion layer, drying and curing the polymer dispersion layer forms a cured polymer layer. After curing and drying, with the cured polymer layer being present on only selected, masked areas of the substrate or light-emitting devices, and with other areas of the substrate or light-emitting devices lacking the cured polymer layer and remaining exposed, a material layer is formed on at least the exposed areas of the substrate or light-emitting devices. After forming the material layer, the cured polymer layer is removed from the masked areas, leaving the material layer on the exposed areas.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.