Optical measuring device and method for plasma magnetic field with adjustable sensitivity
US12411189B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2023 |
| Grant date | Sep 9, 2025 |
| Priority date | — |
| Expiry date | May 24, 2044 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E30/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present disclosure discloses an optical measurement device and method for a plasma magnetic field with adjustable sensitivity. The method comprises the following steps: constructing an optical rotation measurement system based on a pulsed laser beam for measuring an optical rotation image and a shadow image; processing the optical rotation image and the shadow image, and obtaining a distribution of proportional coefficients based on alight intensity distribution; obtaining a distribution of rotation angles based on a mapping relationship between the proportional coefficients and the rotation angles; constructing an interference measurement system based on the pulsed laser beam, and measuring a phase shift of an interference image; calculating a distribution of electron areal densities based on the phase shift in the interference image; obtaining a two-dimensional distribution of an average magnetic field based on the rotation angles and the electron areal densities.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.