Method for ptychography position correction based on probe weighting
US12411328B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 2, 2023 |
| Grant date | Sep 9, 2025 |
| Priority date | — |
| Expiry date | Jun 5, 2044 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/367
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The disclosure provides a method for ptychography position correction based on probe weighting. The method includes: collecting diffraction light field intensity information and simultaneously initializing information functions of illumination probes and a sample to be tested and probe positions; obtaining and importing an exit wave into a propagation model to obtain a simulated diffraction light field and replacing the diffraction light field intensity information to obtain an updated diffraction light field; importing the updated diffraction light field into a backpropagation model and obtaining a diffraction exit wave and updating the information functions of the sample to be tested and the illumination probes at each scan position; and forming a probe matrix around the probe positions, updating the probe positions after calculating a correlation, and repeating the above steps to iterate until the predetermined number of iterations is completed or a predetermined condition is reached.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.