Patent · US Active

Aromatic underlayer

US12411409B2 · kind B2 · utility

0Cited by

3References

13Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Sheng Liu · Bow, US
James F. Cameron · Brookline, US
Shintaro Yamada · Shrewsbury, US
Iou-Sheng Ke · Andover, US
Keren Zhang · Blacksburg, US
Daniel Greene · Pendleton, US
Paul J. LaBeaume · Auburn, US
Li Cui · Westborough, US
Suzanne M. Coley · Mansfield, US

Key dates

Filing date	Apr 30, 2021
Grant date	Sep 9, 2025
Priority date	—
Expiry date	Jan 27, 2044

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/091
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.