Organometallic photoresist developer compositions and processing methods
US12416861B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Apr 10, 2020 |
| Grant date | Sep 16, 2025 |
| Priority date | — |
| Expiry date | Dec 26, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/422
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Developer compositions are described based on blends of solvents, in which the developers are particularly effective for EUV patterning using organometallic based patterning compositions. Methods for use of these developing compositions are described. The blends of solvents can be selected based on Hansen solubility parameters. Generally, one solvent has low polarity as express by the sum of δP+δH, and a second solvent component of the developer has a higher value of δP+δH. Corresponding solvent compositions are described.
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