Substrate processing apparatus and substrate processing method
US12417931B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 22, 2022 |
| Grant date | Sep 16, 2025 |
| Priority date | — |
| Expiry date | Jul 12, 2043 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B2203/027
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus includes a processing liquid tank, a first circulation pipe, a filter, a pump, and a controller. The first circulation pipe has an upstream end connected to the processing liquid tank and a downstream end connected to the processing liquid tank. A processing liquid circulates in the first circulation pipe. The filter is deposed in the first circulation pipe and captures particles contained in the processing liquid. The pump is disposed in the first circulation pipe. The pump includes a rotor and feeds the processing liquid by rotating the rotor. In activation of the pump in a stopped state, the controller controls the pump so that the rotor rotates at a rotational acceleration of no greater than 400 rpm/sec.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.