Patent · US Active

Systems, methods and apparatus for dispensing fluid to an object

US12417935B1 · kind B1 · utility

0Cited by
1References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 6, 2023
Grant dateSep 16, 2025
Priority date
Expiry dateOct 21, 2043

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2291/2697
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Systems, methods and apparatus related to pre-wetting an edge portion of a bonded wafer prior to wetting a flat, horizontal portion of the bonded wafer. The apparatus includes a frame having nozzles directed such that couplant discharged from these nozzles wet the edge of the wafer. The edge nozzles have couplant flow vectors that interface to dampen the trajectory of fluid to reduce splash and pre-wet the edges of the bonded wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.