Patent · US Active

N-type TOPCon cell with double-sided aluminum paste electrodes, and preparation method for preparing N-type TOPCon cell with double-sided aluminum paste electrodes

US12419135B2 · kind B2 · utility

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Key dates

Filing dateMay 25, 2021
Grant dateSep 16, 2025
Priority date
Expiry dateMay 25, 2041

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50

Abstract

Some embodiments of the present disclosure provide an N-type TOPCon cell with double-sided aluminum paste electrodes, and a preparation method therefor. The front side of the cell is provided with a front-side silver main grid and a front-side aluminum fine grid, and the back side is provided with a back-side silver main grid and a back-side aluminum fine grid. The method for preparing the cell includes: texturing→B diffusion→BSG removal→alkali polishing→depositing a tunnel oxide layer and a polysilicon layer on a back side of a substrate by means of LPCVD→P diffusion on the back side→PSG removal→plating removal→deposition of an AlOx preparatory layer and a first SiNxHy preparatory layer on the front side→deposition of a second preparatory layer SiNxHy on the back side→UV laser ablation on the front side of the substrate and the back side of the substrate→screen printing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.