Low-expansion borosilicate transparent glaze and a preparation method and use thereof
US12421160B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 26, 2022 |
| Grant date | Sep 23, 2025 |
| Priority date | — |
| Expiry date | Dec 26, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03B25/02
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Disclosed is a low-expansion borosilicate transparent glaze, a preparation method thereof, and use thereof in preparation of a glaze product by secondary fusion-cast molding. The low-expansion borosilicate transparent glaze has raw material composition by mass percentage including: 72%-80% of SiO2, 4%-12% of B2O3, 4%-12% of Na2O, 0.1%-4% of CaO, 0.1%-6% of Al2O3, 0-0.05% of Fe2O3, 0-2% of MgO, 0-2% of K2O, 0-2% of ZnO, 0-2% of BaO, 0-2% of ZrO2, 0-0.5% of Li2O, and 0-0.5% of TiO2, wherein a sum of mass percentages of SiO2, B2O3 and Al2O3 is 85%-95%. The preparation method includes steps of: (1) after mixing dried raw materials, melting at 1400-1540° C. to obtain a high-temperature glass melt; (2) cooling the high-temperature glass melt to 1150-1230° C. to mold; and (3) annealing a molded glass at 530-600° C. to obtain the low-expansion borosilicate transparent glaze.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.