Patent · US Active

Device and method for coating substrates having planar or shaped surfaces by means of magnetron sputtering

US12421592B2 · kind B2 · utility

0Cited by

5References

9Claims

0Family size

Assignee

Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

Michael Vergöhl · Destedt, DE
Andreas Pflug · Braunschweig, DE
Stefan Bruns · Osnabrück, DE
Andre Kaiser · Bielefeld, DE
Thomas Melzig · Leonberg, DE
Tobias Zickenrott · Braunschweig, DE

Key dates

Filing date	Apr 9, 2020
Grant date	Sep 23, 2025
Priority date	—
Expiry date	Nov 17, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3473
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

According to the invention, a device is provided for coating substrates having planar or shaped surfaces by means of magnetron sputtering, by means of which device surfaces having any shape, for examples lenses, aspheres or freeform surfaces which have an adjustable layer-thickness profile, can be coated such that a layer function is maintained on the substantially complete surface. A method for coating substrates having planar or shaped surfaces by means of magnetron sputtering is also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.