Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
US12422752B2 · kind B2 · utility
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Key dates
| Filing date | May 17, 2021 |
| Grant date | Sep 23, 2025 |
| Priority date | — |
| Expiry date | Oct 7, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which an A value determined by Formula (1) is 0.130 or more, and the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more selected from the group consisting of a compound (I) to a compound (III).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.