Active gas generation apparatus
US12424418B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 18, 2022 |
| Grant date | Sep 23, 2025 |
| Priority date | — |
| Expiry date | May 18, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/038
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An object of the present disclosure is to obtain an active gas generation apparatus capable of supplying a highly concentrated active gas from a gas ejection port to a processing space at a subsequent stage. Then, in the active gas generation apparatus (51) of the present disclosure, in a main dielectric space being a space in which an electrode dielectric film (30) and an electrode dielectric film (40) face each other, a region where electrode conductive films (31) and (41) overlap each other in a plan view is defined as a main discharge space (50). In an auxiliary dielectric space being a space where the electrode dielectric film 30 and a shield dielectric film 8 face each other, a region including a dielectric through hole (14) and a cover through hole (15) is defined as an auxiliary discharge space (58). The auxiliary discharge space (58) includes a part of a buffer space (9) above the shield dielectric film (8), and a path leading from the auxiliary discharge space (58) to the gas ejection port (61.62) is defined as an active gas flow path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.