Process monitor and process monitoring method
US12424469B2 · kind B2 · utility
0Cited by
7References
5Claims
0Family size
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Key dates
| Filing date | Sep 17, 2022 |
| Grant date | Sep 23, 2025 |
| Priority date | — |
| Expiry date | Feb 26, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67248
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process monitor includes a photodetector that separately measures intensities of radiant light from a semiconductor member being annealed, in a plurality of wavelength ranges that are different from each other, and a processing device that obtains a physical quantity related to the semiconductor member that changes due to annealing, based on the intensities in the plurality of wavelength ranges measured by the photodetector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.