Photomechanical polymers, compositions, and methods
US12426494B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Mar 24, 2023 |
| Grant date | Sep 23, 2025 |
| Priority date | — |
| Expiry date | Jun 3, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K2101/10
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Photopolymers, monomers, compositions including photopolymers and a dopant, and methods, including methods for eliciting a photomechanical response. The dopant may be a triplet sensitizing dopant. The exposing of compositions to the one or more wavelengths of electromagnetic radiation may elicit a photomechanical response via a triplet excited state mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.