Deposition apparatus and method for seating mask of deposition apparatus
US12428717B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2021 |
| Grant date | Sep 30, 2025 |
| Priority date | — |
| Expiry date | May 28, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An embodiment provides a deposition apparatus including a mask frame, an opening sheet, a deposition mask, and an electrostatic chuck. In the mask frame, a first opening part is defined. The opening sheet is disposed on the mask frame. In the opening sheet, a second opening part overlapping the first opening part is defined. The deposition mask is disposed on the opening sheet. In the deposition mask, a plurality of third opening parts overlapping the second opening part are defined. The electrostatic chuck is disposed on the deposition mask and on which a substrate is disposed. The substrate is disposed on a surface of the electrostatic chuck, and AC power is applied to the deposition mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.