Patent · US Active

Sacrificial nanotransfer lithography for the metalization of plastics

US12429763B2 · kind B2 · utility

0Cited by
1References
9Claims
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Key dates

Filing dateJun 3, 2020
Grant dateSep 30, 2025
Priority date
Expiry dateAug 28, 2042

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB82Y40/00
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Processes for producing layered components that may include depositing a strike layer on a substrate; forming a nanomaterial layer on the strike layer, the nanomaterial layer having a nanotextured surface comprising a plurality of nanofeatures; embedding a polymeric material at least partially within the nanotextured surface; and separating the strike layer from the substrate to obtain the layered component. Layered components that may include a nanomaterial layer having a nanotextured surface comprising a plurality of nanofeatures; and a polymeric material at least partially embedded within the nanotextured surface. Nanotextured polymeric materials and layered components produced by various processes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.