Generation of permanent phase holograms and relief patterns in durable media by chemical etching
US3944420A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 22, 1974 |
| Grant date | Mar 16, 1976 |
| Priority date | — |
| Expiry date | May 22, 1994 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/90
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A surface relief pattern, e.g. a surface relief hologram, is substantially linearly transferred to a hard durable substrate, capable of being used as a medium for permanent storage of the pattern or as a master for replicating the hologram, from a photoresist coated on the substrate, by exposing the photoresist and the substrate to a photoresist developer bath and a chemical bath capable of etching the substrate at a rate substantially proportional to the development rate of the photoresist. This technique allows the transfer of surface relief patterns with dimensions on the order of one micron or less, and is applicable to the formation of surface relief holographic patterns in permanent media for archival storage and to making master surface relief holograms.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.