Process for surface work strain relief of electrooptic crystals
US3954940A · kind A · utility
5Cited by
5References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 4, 1974 |
| Grant date | May 4, 1976 |
| Priority date | — |
| Expiry date | Nov 4, 1994 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/0305
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An electrooptic crystal having improved characteristics including an improved light extinction ratio and a process of making same including etching certain portions of the lateral surfaces thereof so as to relieve surface and other strain in the crystal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.