Method and apparatus for extracting well-formed, high current ion beams from a plasma source
US3955091A · kind A · utility
15Cited by
3References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 11, 1974 |
| Grant date | May 4, 1976 |
| Priority date | — |
| Expiry date | Nov 11, 1994 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J27/08
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A well-formed ion beam having a high current is extracted from an ion plasma by a low perveance ion extraction system including focus and extraction electrodes, the extraction electrode having an ion exit aperture and being axially spaced from the focus electrode a distance of at least several times the diameter of the ion exit aperture. A voltage differential is applied between the electrodes to define a plasma sheath at the ion source aperture, and the ion beam is extracted from the plasma sheath.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.