Method of diffusing silicon slices with dopant at high temperatures
US3956036A · kind A · utility
3Cited by
3References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 10, 1975 |
| Grant date | May 11, 1976 |
| Priority date | — |
| Expiry date | Feb 10, 1995 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/2254
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of applying a boron dopant to silicon slices which comprises applying a dopant solution to the faces of each slice, packing a plurality of slices adjoining each other in a quartz boat and inserting the boat slowly into a tubular furnace. The boron surface of each slice is covered with alumina powder to eliminate sticking. After heating at 1350.degree. Celsius for four hours the slices are slowly pulled out of furnace.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.