Method for developing electron beam sensitive resist films
US3961100A · kind A · utility
14Cited by
9References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 16, 1974 |
| Grant date | Jun 1, 1976 |
| Priority date | — |
| Expiry date | Sep 16, 1994 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The effective sensitivity of a photo- or electron beam resist is improved by contacting the resist film with developer solution and water prior to exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.