Patent · US Expired

Method for the preparation of relief printing masters

US3964907A · kind A · utility

7Cited by
3References
13Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 2, 1975
Grant dateJun 22, 1976
Priority date
Expiry dateSep 2, 1995

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/121
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Disclosed is a method for the preparation of a relief printing master which is based on irradiation of a film of a composition comprising A. a degradable polymer containing segments characterized by the structural formula ##EQU1## wherein R is H, an alkyl radical of 1 to 6 carbon atoms, a chlorine or fluorine substituted alkyl radical of 1 to 6 carbon atoms or a cyano substituted aliphatic hydrocarbon radical of 1 to 5 carbon atoms, and B. a photosensitizer which upon exposure to actinic radiation assumes a .sup.3 (n, .pi.*) or a .sup.1 (n, .pi.*) state. The polymer and photosensitizer combination, which is in the form of a thin film upon a suitable substrate, is exposed in an imagewise manner to actinic radiation to thereby degrade the polymer. Upon such degradation, depressions are formed in the exposed areas thereby rendering the exposed film suitable for use as a relief printing master.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.