Positive resists containing dimethylglutarimide units
US3964908A · kind A · utility
19Cited by
4References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 22, 1975 |
| Grant date | Jun 22, 1976 |
| Priority date | — |
| Expiry date | Sep 22, 1995 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation, has a high glass transition temperature, a high temperature resistance, and is capable of very fine spatial resolution, very suitable for micro circuitry processings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.