Photosensitive film comprising an organopolyselenide and an organomercury compound
US3967964A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 1, 1975 |
| Grant date | Jul 6, 1976 |
| Priority date | — |
| Expiry date | Aug 1, 1995 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/734
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Polymeric matrices such as poly(vinylchloride) and poly(methylmethacrylate) loaded with mixtures of an organopolyselenide characterized by the formula: EQU R.sub.1 -- (Se).sub.n -- R.sub.2 and an organomercury compound characterized by the formula: EQU R.sub.3 --Hg--R.sub.4 form the basis for high resolution and contrast microimaging film systems. Irradiation of these films with activating radiation results in dark images in light struck areas and colorless background. The microimaging film is a negative working system with add-on reimaging capability. The images are stable to projection in conventional slide projection systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.