Lateral photodetector of improved sensitivity
US3971057A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 21, 1973 |
| Grant date | Jul 20, 1976 |
| Priority date | — |
| Expiry date | Aug 21, 1993 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/98
Abstract
A lateral photodetector of improved sensitivity and method of making the e. The photodetector consists of semiconductive wafer, having a transparent layer of metal deposited on its front face to form a Schottky barrier. A negative bias is applied to the Schottky barrier to form a depletion region in the wafer. A low resistivity layer is formed on back of the wafer to which four signal electrodes are attached. Before forming the cell, the semiconductor wafer was exposed to nuclear radiation to increase the responsivity of the cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.