Method and apparatus for improving the accuracy of measuring the length of a gaging standard by laser interferometer means
US3975100A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 13, 1974 |
| Grant date | Aug 17, 1976 |
| Priority date | — |
| Expiry date | Sep 13, 1994 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B9/02049
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The accuracy with which the distance between the end faces of a length type of gaging standard can be measured by a laser interferometer is improved by mounting the gaging probe at one end of a slide in fixed coaxial alignment with a laser beam target secured to the opposite end thereof. The slide is, in turn, mounted on a slidable carrier to form a V-notch of changeable width containing a steel ball whose weight imparts a predetermined thrust to the gaging probe unaffected by the force required to move the carrier so as to bring the probe into gaging contact with a fixed surface. A planar surface is adjustably swiveled into cohesive coincidence with one end face of the length standard to duplicate the orientation thereof relative to the gaging table which supports the length standard. Thus, the contact of the gaging probe with the end face of the length standard at the start of the displacement of the laser beam target will be identical to the contact thereof with the planar face at the conclusion of the displacement thereby providing an accuracy of measurement to within several millionths of an inch.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.