Light-sensitive diazoketone and azide compositions and photographic elements
US3984250A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 9, 1971 |
| Grant date | Oct 5, 1976 |
| Priority date | — |
| Expiry date | Feb 9, 1991 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/105
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Light-sensitive compositions including a polymer of the type that is reactable with an azide sensitizer when exposed to light and a sensitizing amount of a naphthalene sensitizer having ortho diazo and oxo substituents at the 1,2 or the 2,1 positions of the naphthalene nucleus and further having an azidosulfonyl substituent group of which the sulfonyl moiety is bonded directly to the naphthalene nucleus at the 4 or the 5-position, are advantageous in the preparation of positive-working photolithographic materials. IN the azidosulfonyl group, the azido moiety can be linked directly or indirectly to the sulfonyl moiety, such as in the compounds 2-diazo-1,2-dihydro-1-oxo-5(4'-azidophenoxysulfonyl)naphthalene and 5-azidosulfonyl-2-diazo-1,2-dihydro-1-oxonaphthalene. The light-sensitive compositions can be coated on support materials to prepare composite photographic elements having utility as photolithographic printing masters and photoresists for etching operations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.