Method of depositing material on a heated substrate
US3985917A · kind A · utility
5Cited by
6References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 11, 1974 |
| Grant date | Oct 12, 1976 |
| Priority date | — |
| Expiry date | Feb 11, 1994 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/545
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention is directed to the deposition of a coating on a substrate by reacting vaporized chemicals on contact with a heated surface to deposit a coating. According to the invention, the deposition surface is cleaned and coated in a single stage reactor. Means are also provided--where a boron deposit is wanted--to deposit an amorphous boron coating on the deposition surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.