Patent · US Expired

Semiconductor integrated circuits and method of manufacturing the same

US3990102A · kind A · utility

17Cited by
2References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 26, 1975
Grant dateNov 2, 1976
Priority date
Expiry dateJun 26, 1995

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S148/122
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Semiconductor integrated circuits comprising a dielectric isolation semiconductor chip having a plurality of monocrystalline semiconductor regions electrically separated by a polycrystalline semiconductor and dielectric insulation films, and circuit elements formed in the monocrystalline regions, wherein the polycrystalline substrate includes a high resistivity layer and a low resistivity layer, at least the high resistivity layer is adjacent to the monocrystalline region and the low resistivity region is coupled to a contact provided on a surface of the chip, whereby an electrostatic coupling between the circuit elements is shielded by the low resistivity layer to prevent cross-talks due to the electrostatic coupling. A method of manufacturing the same is also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.