Method of separating apertured shadow mask flats after annealing
US3991450A · kind A · utility
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3References
1Claims
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Key dates
| Filing date | Jun 10, 1975 |
| Grant date | Nov 16, 1976 |
| Priority date | — |
| Expiry date | Jun 10, 1995 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/306
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of separating apertured shadow mask flats after annealing in which a stack of thin flats is passed through a roller leveler, with the rollers set apart by a dimension slightly less than the thickness of the stack.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.