Patent · US Expired

Method of separating apertured shadow mask flats after annealing

US3991450A · kind A · utility

0Cited by
3References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 10, 1975
Grant dateNov 16, 1976
Priority date
Expiry dateJun 10, 1995

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/306
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A method of separating apertured shadow mask flats after annealing in which a stack of thin flats is passed through a roller leveler, with the rollers set apart by a dimension slightly less than the thickness of the stack.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.