Production of halogen-containing tertiary phosphine oxides

US3998886A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Bernd Lippsmeier
• Klaus Hestermann · Lechenich, DE
• Hubert Neumaier

Key dates

• Filing date: Mar 13, 1975
• Grant date: Dec 21, 1976
• Expiry date: Mar 13, 1995

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C07F9/5407
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

Production of halogen-containing tertiary phosphine oxides of the general formula (I) ##STR1## in which R.sub.1 stands for an alkyl, halogenoalkyl, alkenyl, halogenoalkenyl, alkinyl or halogenoalkinyl radical, each of these radicals containing from 1 to 18 carbon atoms, or stands for a cycloalkyl, a halogenated cycloalkyl, an aryl, a halogenated aryl, an aralkyl or a halogenated aralkyl radical, and X stands for halogen. The oxides are made by subjecting a compound of the general formula (II) ##STR2## in which R has the same meaning as R.sub.1 and X stands for halogen, to thermal treatment in the presence of hydrogen halide at atmospheric or at elevated pressure so as to split off water and formaldehyde in vapor form therefrom; by continuously freeing the resulting reaction mixture from the said components in vapor form; by terminating the reaction and thereafter stripping off the hydrogen halide from the reaction mixture by introducing an inert gas thereinto; and by purifying the remaining crude product by distillation or recrystallization.