Reticle-lens system
US3999301A · kind A · utility
3Cited by
3References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 24, 1975 |
| Grant date | Dec 28, 1976 |
| Priority date | — |
| Expiry date | Jul 24, 1995 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24917
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of producing an optical reticle and the reticle produced thereby. thin layer of aluminum is deposited on the face of a sapphire substrate and a reticle pattern is chemically etched therein. The system is then exposed to air at an elevated temperature for approximately one hour to oxidize the remaining aluminum layer. A film of titanium is next placed over the rough aluminum oxide as by sputtering, for example, and the excess titanium is etched away by the same pattern to produce the finished reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.